GC-MS analysis of anti-mark ointment formulation for skin burns
DOI:
https://doi.org/10.7439/ijpc.v7i11.4514Keywords:
Adolescents, obesity, anthropometric measurements, BMI, TSFT (Triceps skinfold thickness), SSFT (Subscapular skinfold thickness)Abstract
Wounds generated from burns are fatal and cause marks that last for a long period of time. The formulation of anti marks cream especially for burns would provide hope for a better way of treating scars. The aim of this study is to prepare an ointment using hair ash and oil along with aloevera followed by the characterization of compounds by using Gas Chromatography and Mass Spectroscopy (GC-MS).The natural compounds used could possibly reduce any side effects on the skin. The GC-MS analysis of the ointment revealed the presence of 30 bioactive compounds. The predominant bioactive compounds were especially fatty acids such as hexadecanoic acid, tetradecanoic acid, dodecanoic acid and octadecanoic acid. The antibacterial, antioxidant, anti-inflammatory, antifungal properties of these bioactive compounds could be effectively used in the treatment of scars.Downloads
References
Paudel Chhetri H., Shrestha Yogol N., Sherchan J., Mansoor S., and Thapa P.,
Anthonissen E. Daly M, Janssens D, Van den T, Kerckhove,
S. A. Mable Taoi, Iris Wainiqolo, Berlin Kafoa, Bridget Kool, Asilika Naisaki, Eddie McCaig,
Goel A. and Shrivastava P.,
Tiwari V.K.,
M. Pecanac, Z. Janjic, A. Komarcevic, M. Pajic, D. Dobanovacki, and S. S. Miskovic,
M. R. Khan, M. Kihara, and A. D. Omoloso,
C. A. Alalor, C. I. Igwilo, and C. P. Azubuike,
W. M
Gholamreza Shariat Hamid Galehdari, corresponding author1 Samira Negahdari, 2 Mahnaz Kesmati, 2 Anahita Rezaie,
R. Rajeswari, C. S. R., M. Umadevi, and D. B. , S. Selvavenkadesh, K. P. Sampath Kumar,
E. O. C. F. (Linum usitatissimum L. O. I. B. W. H. I. N. Z. RABBITS,
Y. Li, C. Guo, J. Yang, J. Wei, J. Xu, and S. Cheng,
S. Madrigal-Carballo, G. Rodriguez, C. G. Krueger, M. Dreher, and J. D. Reed,
G. L. G. Falguni Basuli, Haitao Wu, Zhen-Dan Shi, Bao Teng, Changhui Li, Agnieszka Sulima, Aaron Bate, Philip Young, Mathew McMillan,
L. Kuerschner et al.,
F. Paltauf,
F. M. D. Ismail, D. O. Levitsky, and V. M. Dembitsky,
Teruaki Nakatsuji, Mandy C. Kao, Jia-You Fang, Christos C. Zouboulis, Liangfang Zhang, Richard L. Gallo, and Chun-Ming Huang,
D. H. Kim et al.,
Z. hui Pu et al.,
N. Cole, E. B. H. Hume, I. Jalbert, A. Kumar Vijay, R. Krishnan, and M. D. P. Willcox,
S. R. Parker, H. G. Cutler, J. M. Jacyno, and R. A. Hill,
A. Goel and V. J. Ram,
M. L. Cartron et al.,
Matthias Siebeck, Thomas Nolte, Maryam Zadeh-Khorasani, Orkhan Safarov, Franziska Rueff, Rita Varga, Nadja Herbach, R
A. R. Othman, N. Abdullah, S. Ahmad, I. S. Ismail, and M. P. Zakaria,
S. M. Courtney et al.,
K. Rizwan, M. Zubair, N. Rasool, M. Riaz, M. Zia-Ul-Haq, and V. de Feo,
P. L. G. Chong, U. Ayesa, V. Prakash Daswani, and E. C. Hur,
V. Shevyrin, V. Melkozerov, A. Nevero, O. Eltsov, A. Baranovsky, and Y. Shafran,
D. Janes, D. Kantar, S. Kreft, and H. Prosen,
F. Al Momani, A. S. Alkofahi, and N. M. Mhaidat,
J. Singh, S. Sharma, R. Vig, and A. Sabharwal,
V. S. C. Yeh,
D. Davyt and G. Serra,
T. J. Egan,
S. N. Pandeya and A. Tyagi,
J. P. Michael,
M. Foley and L. Tilley,
X. Pudroma, J. Moan, L. W. Ma, V. Iani, and A. Juzeniene,
G. Gratzl, C. Paulik, S. Hild, J. P. Guggenbichler, and M. Lackner,
H. Scheuren, J. Tippmann, F. J. Methner, and K. Sommer,
U. Ravid, E. Putievsky, I. Katzir, and R. Ikan,
S. K
C. P. Yang, S. H. Hsiao, and K. H. Chen,
H. J. Kn
A. W. Schmidt, K. R. Reddy, and H. J. Kn
M. H. Amin F. M. Fahmy, Amira A. El-Sayed,
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